| 7842931 |
Extraction electrode manipulator |
Shu Satoh, Manny Sieradzki |
2010-11-30 |
| 6167834 |
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
2001-01-02 |
| RE36623 |
Process for PECVD of silicon oxide using TEOS decomposition |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
2000-03-21 |
| 5871811 |
Method for protecting against deposition on a selected region of a substrate |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1999-02-16 |
| 5755886 |
Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1998-05-26 |
| 5362526 |
Plasma-enhanced CVD process using TEOS for depositing silicon oxide |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1994-11-08 |
| 5354715 |
Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1994-10-11 |
| 5000113 |
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1991-03-19 |
| 4892753 |
Process for PECVD of silicon oxide using TEOS decomposition |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1990-01-09 |
| 4872947 |
CVD of silicon oxide using TEOS decomposition and in-situ planarization process |
David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more |
1989-10-10 |
