Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5479108 | Method and apparatus for handling wafers | — | 1995-12-26 |
| 5452078 | Method and apparatus for finding wafer index marks and centers | — | 1995-09-19 |
| 5369286 | Method and apparatus for measuring stress in a film applied to surface of a workpiece | — | 1994-11-29 |
| 5304248 | Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions | Mei Cheng | 1994-04-19 |
| 5292393 | Multichamber integrated process system | Dan Maydan, Sasson Somekh, David N. Wang, Masato Toshima, Isaac Harari +1 more | 1994-03-08 |
| 5280983 | Semiconductor processing system with robotic autoloader and load lock | Dan Maydan, Sasson Somekh, Charles Ryan-Harris, Richard A. Seilheimer, Edward M. Abolnikov +5 more | 1994-01-25 |
| 5270560 | Method and apparatus for measuring workpiece surface topography | — | 1993-12-14 |
| 5233201 | System for measuring radii of curvatures | — | 1993-08-03 |
| 5227641 | System for measuring the curvature of a semiconductor wafer | — | 1993-07-13 |
| 5224809 | Semiconductor processing system with robotic autoloader and load lock | Dan Maydan, Sasson Somekh, Charles Ryan-Harris, Richard A. Seilheimer, Edward M. Abolnikov +5 more | 1993-07-06 |
| 5215619 | Magnetic field-enhanced plasma etch reactor | Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews, Mei Chang +4 more | 1993-06-01 |
| 5186594 | Dual cassette load lock | Masato Toshima, Phil Salzman, Steven Murdoch, Cheng Wang, Mark A. Stenholm +2 more | 1993-02-16 |
| 5160402 | Multi-channel plasma discharge endpoint detection method | — | 1992-11-03 |
| 5118955 | Film stress measurement system having first and second stage means | — | 1992-06-02 |
| 5050782 | Measured volume liquid dispenser having a rotatable plunger with a radial projection for selectively engaging one of a plurality of axial channels formed in the pump cylinder | — | 1991-09-24 |
| 5028565 | Process for CVD deposition of tungsten layer on semiconductor wafer | Mei Chang, Cissy Leung, David N. Wang | 1991-07-02 |
| 4962049 | Process for the plasma treatment of the backside of a semiconductor wafer | Mei Chang | 1990-10-09 |
| 4951601 | Multi-chamber integrated process system | Dan Maydan, Sasson Somekh, David N. Wang, Masato Toshima, Isaac Harari +1 more | 1990-08-28 |
| 4927485 | Laser interferometer system for monitoring and controlling IC processing | Robert HARTLAGE, Wesley W. Zhang | 1990-05-22 |
| 4911597 | Semiconductor processing system with robotic autoloader and load lock | Dan Maydan, Sasson Somekh, Charles Ryan-Harris, Richard A. Seilheimer, Edward M. Abolnikov +5 more | 1990-03-27 |
| 4842683 | Magnetic field-enhanced plasma etch reactor | Dan Maydan, Sasson Somekh, Kenneth R. Stalder, Dana L. Andrews, Mei Chang +4 more | 1989-06-27 |
| 4819167 | System and method for detecting the center of an integrated circuit wafer | Wesley W. Zhang | 1989-04-04 |
| 4668338 | Magnetron-enhanced plasma etching process | Dan Maydan, Sasson Somekh, Mei Cheng | 1987-05-26 |
| 4496957 | Optical disk | Thomas W. Smith, Anthony T. Ward | 1985-01-29 |
| 4466087 | Optical memory system for a reading/writing, verifying and tracking module | — | 1984-08-14 |