SY

Sanjay K. Yedur

AM AMD: 34 patents #265 of 9,279Top 3%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
TT Timbre Technologies: 3 patents #11 of 39Top 30%
🗺 California: #10,539 of 386,348 inventorsTop 3%
Overall (All Time): #73,986 of 4,157,543Top 2%
42
Patents All Time

Issued Patents All Time

Showing 26–42 of 42 patents

Patent #TitleCo-InventorsDate
6423479 Cleaning carbon contamination on mask using gaseous phase Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo 2002-07-23
6396059 Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM Bhanwar Singh, Bryan K. Choo 2002-05-28
6376013 Multiple nozzles for dispensing resist Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton 2002-04-23
6373053 Analysis of CD-SEM signal to detect scummed/closed contact holes and lines Bryan K. Choo, Bhanwar Singh, Khoi A. Phan 2002-04-16
6371134 Ozone cleaning of wafers Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo 2002-04-16
6354133 Use of carbon nanotubes to calibrate conventional tips used in AFM Bhanwar Singh, Bryan K. Choo, Michael K. Templeton, Ramkumar Subramanian 2002-03-12
6326231 Use of silicon oxynitride ARC for metal layers Ramkumar Subramanian, Bhanwar Singh, Marina V. Plat, Christopher F. Lyons, Bharath Rangarajan +1 more 2001-12-04
6270579 Nozzle arm movement for resist development Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton 2001-08-07
6248175 Nozzle arm movement for resist development Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton 2001-06-19
6245493 Method for reducing surface reflectivity by increasing surface roughness Bhanwar Singh, Bharath Rangarajan, Michael K. Templeton, Christopher F. Lyons 2001-06-12
6197455 Lithographic mask repair using a scanning tunneling microscope Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton, Kathleen R. Early 2001-03-06
6191046 Deposition of an oxide layer to facilitate photoresist rework on polygate layer Bhanwar Singh, Bharath Rangarajan 2001-02-20
6190062 Cleaning chamber built into SEM for plasma or gaseous phase cleaning Ramkumar Subramanian, Khoi A. Phan, Bharath Rangarajan, Bhanwar Singh, Bryan K. Choo 2001-02-20
6187666 CVD plasma process to fill contact hole in damascene process Bhanwar Singh, Michael K. Templeton, Bharath Rangarajan, Christopher F. Lyons, Ramkumar Subramanian 2001-02-13
6117618 Carbonized antireflective coating produced by spin-on polymer material Bhanwar Singh, Bharath Rangarajan, Michael K. Templeton 2000-09-12
6057914 Method for detecting and identifying a lens aberration by measurement of sidewall angles by atomic force microscopy Bhanwar Singh, Bharath Rangarajan 2000-05-02
6034771 System for uniformly heating photoresist Bharath Rangarajan, Bhanwar Singh, Michael K. Templeton 2000-03-07