Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11295925 | Electron gun device | Hiroshi Yasuda, Tatsuya Shibaoka, Hidekazu Murata | 2022-04-05 |
| 8530857 | Stage device | Youichi Shimizu | 2013-09-10 |
| 8390201 | Multi-column electron beam exposure apparatus and magnetic field generation device | Hiroshi Yasuda, Takeshi Haraguchi | 2013-03-05 |
| 7919750 | Electron gun, electron beam exposure apparatus, and exposure method | Hiroshi Yasuda, Takeshi Haraguchi, Takamasa Satoh, Yoshinori Terui, Seiichi Sakawa +1 more | 2011-04-05 |
| 7777202 | Electron beam exposure apparatus involving the position and velocity calculation | Takamasa Satoh | 2010-08-17 |
| 7737421 | Electron beam exposure apparatus and method for cleaning the same | Hiroshi Yasuda | 2010-06-15 |
| 6911780 | Electron beam, generating device, and testing device | Yoichi Shimizu | 2005-06-28 |
| 6727658 | Electron beam generating apparatus and electron beam exposure apparatus | Yoichi Shimizu, Takamasa Satoh, Takeshi Haraguchi | 2004-04-27 |
| 6509568 | Electrostatic deflector for electron beam exposure apparatus | Hitoshi Tanaka, Takeshi Haraguchi, Kazuto Ashiwara, Tomohiko Abe, Ryoji Kato | 2003-01-21 |
| 6465796 | Charge-particle beam lithography system of blanking aperture array type | Takeshi Haraguchi, Tomohiko Abe | 2002-10-15 |
| 6407398 | Electron beam exposure apparatus and exposure method | Masaki Kurokawa, Tatsuro Ohkawa | 2002-06-18 |
| 6268606 | Electrostatic deflector, for electron beam exposure apparatus, with reduced charge-up | Tomohiko Abe, Hiroshi Yasuda | 2001-07-31 |
| 6252344 | Electron gun used in an electron beam exposure apparatus | Takamasa Satoh, Akio Yamada, Hiroshi Yasuda | 2001-06-26 |
| 6046459 | Method and system for charged particle beam exposure | Nobuyuki Yasutake, Kazushi Ishida, Hiroshi Yasuda, Akiyoshi Tsuda, Hitoshi Tanaka | 2000-04-04 |
| 6008495 | Electron beam exposure device | Hitoshi Tanaka | 1999-12-28 |
| 5981118 | Method for charged particle beam exposure with fixed barycenter through balancing stage scan | Nobuyuki Yasutake, Kazushi Ishida, Hiroshi Yasuda, Akiyoshi Tsuda, Hitoshi Tanaka | 1999-11-09 |
| 5945683 | Electron beam exposure device | Tatsuro Ohkawa, Hitoshi Tanaka, Hiroshi Yasuda | 1999-08-31 |
| 5892237 | Charged particle beam exposure method and apparatus | Kenichi Kawakami, Hiroshi Yasuda, Akio Yamada, Tatsuro Ohkawa, Mitsuhiro Nakano +1 more | 1999-04-06 |
| 5708276 | Electron-beam exposure device and a method of detecting a mark position for the device | Tatsuro Ohkawa, Kawakami Kenichi, Tohru Ikeda, Kazushi Ishida | 1998-01-13 |