Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin, Anthony Yen | 2025-09-30 |
| 12265322 | EUV mask blank and method of making EUV mask blank | Ping-Hsun Lin, Pei-Cheng Hsu, Ta-Cheng Lien, Chia-Jen Chen, Hsin-Chang Lee | 2025-04-01 |