Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Anthony Yen | 2025-09-30 |
| 12320782 | Acoustic measurement of fabrication equipment clearance | Jun DENG, Kuan-Wen Lin, Yu-Ching Lee | 2025-06-03 |