Issued Patents 2025
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Shinn-Sheng Yu, Ching-Fang Yu, Wen-Chuan Wang, Sheng-Chi Chin, Anthony Yen | 2025-09-30 |
| 12393124 | High throughput and high position accurate method for particle inspection of mask pods | Shih-Jui Huang, ShinAn KU, Hsin-Chang Lee | 2025-08-19 |