Issued Patents 2025
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12429776 | Lithography method with reduced impacts of mask defects | Ching-Fang Yu, Wen-Chuan Wang, Ting-Hao Hsu, Sheng-Chi Chin, Anthony Yen | 2025-09-30 |
| 12406130 | Geometric mask rule check with favorable and unfavorable zones | Shih-Ming Chang, Jue-Chin Yu, Ping-Chieh Wu | 2025-09-02 |
| 12235589 | Method of manufacturing a semiconductor device and apparatus for manufacturing the semiconductor device | Ru-Gun Liu, Hsu-Ting Huang, Kenji Yamazoe, Minfeng Chen, Shuo-Yen Chou +1 more | 2025-02-25 |