PW

Patrick Warnaar

AB Asml Netherlands B.V.: 6 patents #9 of 543Top 2%
AN Asml Holding N.V.: 1 patents #19 of 75Top 30%
📍 Tilburg, NL: #2 of 36 inventorsTop 6%
Overall (2024): #22,786 of 561,600Top 5%
6
Patents 2024

Issued Patents 2024

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
12112260 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate Lorenzo Tripodi, Grzegorz Grzela, Mohammadreza Hajiahmadi, Farzad Farhadzadeh, Patricius Aloysius Jacobus Tinnemans +5 more 2024-10-08
12105432 Metrology method and associated computer product Narjes JAVAHERI, Maurits Van Der Schaar, Tieh-Ming Chang, Hilko Dirk Bos, Samira Bahrami +3 more 2024-10-01
12066764 Metrology apparatus and method for determining a characteristic of one or more structures on a substrate Patricius Aloysius Jacobus Tinnemans, Vasco Tomas Tenner, Maurits Van Der Schaar 2024-08-20
12019377 Target for measuring a parameter of a lithographic process Maurits Van Der Schaar, Olger Victor Zwier 2024-06-25
12007700 Metrology system and method for determining a characteristic of one or more structures on a substrate Patricius Aloysius Jacobus Tinnemans, Arie Jeffrey Den Boef, Armand Eugene Albert Koolen, Nitesh Pandey, Vasco Tomas Tenner +1 more 2024-06-11
11982946 Metrology targets Nikhil Mehta, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij, Hugo Augustinus Joseph Cramer, Olger Victor Zwier +1 more 2024-05-14