Issued Patents 2023
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11855096 | Uniform gate width for nanostructure devices | Jui-Chien Huang, Shih-Cheng Chen, Chih-Hao Wang, Kuo-Cheng Chiang, Jung-Hung Chang +3 more | 2023-12-26 |
| 11855216 | Inner spacers for gate-all-around transistors | Kuo-Cheng Chiang, Shih-Cheng Chen, Chih-Hao Wang, Pei-Hsun Wang, Lo-Heng Chang +1 more | 2023-12-26 |
| 11855168 | Semiconductor device and manufacturing method thereof | Wei-Hao Wu, Ting-Hung Hsu, Kuan-Lun Cheng | 2023-12-26 |
| 11854908 | Multi-gate device and related methods | Kuan-Ting Pan, Huan-Chieh Su, Shi Ning Ju, Yi-Ruei Jhan, Kuo-Cheng Chiang +1 more | 2023-12-26 |
| 11855084 | Integrated circuits with FinFET gate structures | Kuo-Cheng Ching, Huan-Chieh Su, Chih-Hao Wang | 2023-12-26 |
| 11855082 | Integrated circuits with FinFET gate structures | Kuo-Cheng Ching, Huan-Chieh Su, Chih-Hao Wang | 2023-12-26 |
| 11848326 | Integrated circuits with gate cut features | Wei-Hao Wu, Jia-Ni Yu, Chih-Hao Wang, Kuo-Cheng Ching | 2023-12-19 |
| 11791401 | Multi-gate device and related methods | Shih-Cheng Chen, Kuo-Cheng Chiang | 2023-10-17 |
| 11776961 | Semiconductor device and manufacturing method thereof for selectively etching dummy fins | Wei-Hao Wu, Jia-Ni Yu | 2023-10-03 |
| 11710774 | Method for forming epitaxial source/drain features and semiconductor devices fabricated thereof | Jung-Hung Chang, Shih-Cheng Chen, Chien Ning Yao, Kuo-Cheng Chiang, Chih-Hao Wang | 2023-07-25 |
| 11705452 | Method (and related apparatus) for forming a semiconductor device with reduced spacing between nanostructure field-effect transistors | Huan-Chieh Su, Kuo-Cheng Chiang | 2023-07-18 |
| 11699760 | Contact structure for stacked multi-gate device | Shih-Cheng Chen, Jung-Hung Chang, Chien Ning Yao, Kuo-Cheng Chiang, Chih-Hao Wang | 2023-07-11 |
| 11676819 | Method for metal gate cut and structure thereof | Pei-Yu Wang, Ching-Wei Tsai, Kuan-Lun Cheng | 2023-06-13 |
| 11631754 | Method of fabricating semiconductor device | Wei-Hao Wu, Jia-Ni Yu | 2023-04-18 |
| 11626402 | Semiconductor device structure | Kuo-Cheng Chiang, Shi Ning Ju, Chih-Hao Wang, Kuan-Ting Pan | 2023-04-11 |
| 11616062 | Gate isolation for multigate device | Shi Ning Ju, Kuo-Cheng Chiang, Kuan-Ting Pan, Chih-Hao Wang, Shih-Cheng Chen | 2023-03-28 |
| 11605737 | Semiconductor device and manufacturing method thereof | Shih-Cheng Chen, Jung-Hung Chang, Lo-Heng Chang, Chien Ning Yao | 2023-03-14 |
| 11581224 | Method for forming long channel back-side power rail device | Huan-Chieh Su, Cheng-Chi Chuang, Chih-Hao Wang, Li-Zhen Yu | 2023-02-14 |
| 11557660 | Method and device for forming cut-metal-gate feature | Wei-Hao Wu, Jia-Ni Yu, Huan-Chieh Su, Ting-Hung Hsu, Chih-Hao Wang | 2023-01-17 |
| 11545400 | Methods of cutting metal gates and structures formed thereof | Tsu-Hsiu Perng, Kai-Chieh Yang, Teng-Chun Tsai, Wei-Hao Wu | 2023-01-03 |