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Methods and apparatus for controlling ion fraction in physical vapor deposition processes |
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| 11780624 |
Device for binding rod bundles |
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Silicon-containing layer for bit line resistance reduction |
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| 11626410 |
Silicon-containing layer for bit line resistance reduction |
Tom Ho Wing Yu, Nobuyuki Sasaki, Jianxin Lei, Wenting Hou, Tza-Jing Gung |
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| 11623259 |
System for flattening steel plates |
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Oxygen controlled PVD ALN buffer for GAN-based optoelectronic and electronic devices |
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| 11552244 |
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Resistance-area (RA) control in layers deposited in physical vapor deposition chamber |
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