Issued Patents 2022
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11538697 | Substrate processing apparatus | Sang Ki Nam, Jang-Yeob Lee, Sungyeol Kim, Sunghyup Kim, Siqing Lu | 2022-12-27 |
| 11476093 | Plasma etching systems and methods with secondary plasma injection | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky | 2022-10-18 |
| 11361939 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2022-06-14 |
| 11355317 | Methods and apparatus for dynamical control of radial uniformity in microwave chambers | Satoru Kobayashi, Lance A. Scudder, David Alexander BRITZ, Dmitry Lubomirsky, Hideo Sugai | 2022-06-07 |
| 11276590 | Multi-zone semiconductor substrate supports | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2022-03-15 |
| 11276559 | Semiconductor processing chamber for multiple precursor flow | Mehmet Tugrul Samir, Dongqing Yang, Dmitry Lubomirsky, Peter M. Hillman, Martin Yue Choy +1 more | 2022-03-15 |
| 11264213 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Jang-Gyoo Yang +4 more | 2022-03-01 |