| 11462469 |
Single mask lithography line end enhancement |
Kevin Lin, Nafees Kabir |
2022-10-04 |
| 11437283 |
Backside contacts for semiconductor devices |
Aaron D. Lilak, Ehren Mannebach, Anh Phan, Stephanie A. Bojarski, Willy Rachmady +4 more |
2022-09-06 |
| 11424160 |
Self-aligned local interconnects |
Aaron D. Lilak, Ehren Mannebach, Anh Phan, Stephanie A. Bojarski, Willy Rachmady +5 more |
2022-08-23 |
| 11373950 |
Advanced lithography and self-assembled devices |
Robert L. Bristol, Kevin Lin, Florian Gstrein, James M. Blackwell, Marie Krysak +6 more |
2022-06-28 |
| 11373900 |
Damascene plug and tab patterning with photobuckets |
Kevin Lin, Robert L. Bristol |
2022-06-28 |
| 11300885 |
EUV phase-shift SRAF masks by means of embedded phase shift layers |
Robert L. Bristol, Guojing Zhang, Tristan A. Tronic, John Magana, Chang Ju Choi +1 more |
2022-04-12 |
| 11264325 |
Interconnects having a portion without a liner material and related structures, devices, and methods |
Manish Chandhok, Tristan A. Tronic |
2022-03-01 |
| 11239112 |
Passivating silicide-based approaches for conductive via fabrication and structures resulting therefrom |
Manish Chandhok, Sudipto Naskar |
2022-02-01 |