| 11406972 |
Activation of protected cross-linking catalysts during formation of dielectric materials |
James M. Blackwell, David J. Michalak, Jessica M. Torres, Jeffery D. Bielefeld |
2022-08-09 |
| 11373950 |
Advanced lithography and self-assembled devices |
Richard E. Schenker, Robert L. Bristol, Kevin Lin, Florian Gstrein, James M. Blackwell +6 more |
2022-06-28 |
| 11320734 |
Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resists |
James M. Blackwell, Robert L. Bristol, Florian Gstrein |
2022-05-03 |
| 11315798 |
Two-stage bake photoresist with releasable quencher |
Robert L. Bristol, James M. Blackwell, Florian Gstrein, Kent N. FRASURE |
2022-04-26 |
| 11262654 |
Chain scission resist compositions for EUV lithography applications |
Lauren Doyle, Patrick Theofanis, James M. Blackwell, Eungnak Han |
2022-03-01 |
| 11251072 |
Differential hardmasks for modulation of electrobucket sensitivity |
Kevin Lin, Robert L. Bristol, James M. Blackwell, Rami Hourani |
2022-02-15 |
| 11227766 |
Metal oxide nanoparticles as fillable hardmask materials |
Florian Gstrein, Manish Chandhok |
2022-01-18 |
| 11217456 |
Selective etching and controlled atomic layer etching of transition metal oxide films for device fabrication |
James M. Blackwell, Scott B. Clendenning, Cen Tan |
2022-01-04 |