Issued Patents 2021
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211465 | Semiconductor device having gate dielectric and inhibitor film over gate dielectric | Mrunal A. Khaderbad, Hsueh Wen Tsau, Chia-Ching Lee, Da-Yuan Lee, Hsiao-Kuan Wei +2 more | 2021-12-28 |
| 11211289 | Metal loss prevention using implantation | Li-Chieh Wu, Tang-Kuei Chang, Kuo-Hsiu Wei, Kei-Wei Chen, Ying-Lang Wang +5 more | 2021-12-28 |
| 11171061 | Method for patterning a lanthanum containing layer | Kun-Yu Lee, Che-Hao Chang, Ching-Hwanq Su, Weng Chang, Xiong-Fei Yu | 2021-11-09 |
| 11145751 | Semiconductor structure with doped contact plug and method for forming the same | Kuo-Ju Chen, Su-Hao Liu, Chun-Hao Kung, Liang-Yin Chen, Kei-Wei Chen +6 more | 2021-10-12 |
| 11133415 | Gradient doped region of recessed Fin forming a FinFET device | Jyun-Hao Lin, Chun-Feng Nieh, Yu-Chang Lin | 2021-09-28 |
| 11088249 | Semiconductor device with implant and method of manufacturing same | Yu-Chang Lin, Tien-Shun Chang, Chun-Feng Nieh | 2021-08-10 |
| 11056573 | Implantation and annealing for semiconductor device | Yu-Chang Lin, Tien-Shun Chang, Szu-Ying Chen, Chun-Feng Nieh, Sen-Hong Syue | 2021-07-06 |
| 10978344 | Melting laser anneal of epitaxy regions | Su-Hao Liu, Wen-Yen Chen, Tz-Shian Chen, Cheng-Jung Sung, Li-Ting Wang +3 more | 2021-04-13 |
| 10950694 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen, Chun-Hung Wu +4 more | 2021-03-16 |
| 10950447 | Semiconductor device having hydrogen in a dielectric layer | Hongfa Luan, Yi-Fan Chen, Chun-Yen Peng, Cheng-Po Chau, Wen-Yu Ku | 2021-03-16 |
| 10930507 | Reduce well dopant loss in FinFETs through co-implantation | Sih-Jie Liu, Chun-Feng Nieh | 2021-02-23 |
| 10916546 | Enhanced channel strain to reduce contact resistance in NMOS FET devices | Yu-Chang Lin, Chun-Feng Nieh, Hou-Yu Chen, Yong-Yan Lu | 2021-02-09 |