Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11199777 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | Hirokazu Nishimaki, Keisuke Hashimoto, Takafumi Endo | 2021-12-14 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Tokio NISHITA, Yasunobu Someya, Takafumi Endo | 2021-12-07 |
| 11169441 | Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device | Daigo Saito, Keisuke Hashimoto | 2021-11-09 |
| 11155684 | Photocrosslinkable group-containing composition for coating stepped substrate | Takafumi Endo, Tadashi Hatanaka | 2021-10-26 |
| 11022884 | Silicon-containing resist underlayer film-forming composition having halogenated sulfonylalkyl group | Wataru SHIBAYAMA, Kenji Takase, Makoto Nakajima, Satoshi Takeda, Hiroyuki Wakayama | 2021-06-01 |
| 11009795 | Aqueous solution for resist pattern coating and pattern forming methods using the same | Tokio NISHITA | 2021-05-18 |
| 10995172 | Self-organized film-forming composition for use in forming a micro-phase-separated pattern | Ryuta MIZUOCHI, Yasunobu Someya, Hiroyuki Wakayama | 2021-05-04 |
| 10894887 | Composition for forming film protecting against aqueous hydrogen peroxide solution | Hikaru TOKUNAGA, Yuto HASHIMOTO, Keisuke Hashimoto | 2021-01-19 |