Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Yasunobu Someya, Takafumi Endo, Rikimaru Sakamoto | 2021-12-07 |
| 11130855 | Composition for forming release layer, and release layer | Kazuya Shindo, Kazuya Ebara, Bangching Ho | 2021-09-28 |
| 11009795 | Aqueous solution for resist pattern coating and pattern forming methods using the same | Rikimaru Sakamoto | 2021-05-18 |