Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11199777 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | Hirokazu Nishimaki, Keisuke Hashimoto, Rikimaru Sakamoto | 2021-12-14 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Tokio NISHITA, Yasunobu Someya, Rikimaru Sakamoto | 2021-12-07 |
| 11155684 | Photocrosslinkable group-containing composition for coating stepped substrate | Rikimaru Sakamoto, Tadashi Hatanaka | 2021-10-26 |