Issued Patents 2021
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11199775 | Resist underlayer film-forming composition containing naphthol aralkyl resin | Ryo Karasawa | 2021-12-14 |
| 11199777 | Resist underlayer film-forming composition containing novolac polymer having secondary amino group | Hirokazu Nishimaki, Rikimaru Sakamoto, Takafumi Endo | 2021-12-14 |
| 11169441 | Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device | Daigo Saito, Rikimaru Sakamoto | 2021-11-09 |
| 10894887 | Composition for forming film protecting against aqueous hydrogen peroxide solution | Hikaru TOKUNAGA, Yuto HASHIMOTO, Rikimaru Sakamoto | 2021-01-19 |