Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11199775 | Resist underlayer film-forming composition containing naphthol aralkyl resin | Keisuke Hashimoto | 2021-12-14 |
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Tokio NISHITA, Yasunobu Someya, Takafumi Endo, Rikimaru Sakamoto | 2021-12-07 |