Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11194251 | Resist underlayer film-forming composition for lithography containing polymer having blocked isocyanate structure | Ryo Karasawa, Tokio NISHITA, Takafumi Endo, Rikimaru Sakamoto | 2021-12-07 |
| 10995172 | Self-organized film-forming composition for use in forming a micro-phase-separated pattern | Ryuta MIZUOCHI, Hiroyuki Wakayama, Rikimaru Sakamoto | 2021-05-04 |