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Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators |
Alexei Marakhtanov, Felix Kozakevich, Michael C. Kellogg, Zhigang Chen, Kenneth Lucchesi +1 more |
2021-12-07 |
| 11158488 |
High speed synchronization of plasma source/bias power delivery |
Aaron T. Radomski, Benjamin J. Gitlin, Larry J. Fisk, II, Mariusz Oldziej, Aaron Michael Burry +5 more |
2021-10-26 |
| 11069553 |
Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity |
Alexander Matyushkin, Harmeet Singh, Alexei Marakhtanov, Keith Gaff, Zhigang Chen +1 more |
2021-07-20 |
| 11024532 |
Electrostatic chuck design for cooling-gas light-up prevention |
Alexander Matyushkin, Alexei Marakhtanov, Keith Gaff, Felix Kozakevich |
2021-06-01 |
| 10916409 |
Active control of radial etch uniformity |
Alexei Marakhtanov, Felix Kozakevich, Bing Ji, Kenneth Lucchesi |
2021-02-09 |
