Issued Patents 2020
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10777650 | Horizontal gate all around device nanowire air gap spacer formation | Shiyu Sun, Nam Sung Kim, Bingxi Wood, Sheng-Chin Kung, Miao Jin | 2020-09-15 |
| 10727080 | Tantalum-containing material removal | Xikun Wang, Soumendra N. Barman, Nitin K. Ingle | 2020-07-28 |
| 10665450 | Methods and apparatus for doping engineering and threshold voltage tuning by integrated deposition of titanium nitride and aluminum films | Yixiong Yang, Paul F. Ma, Wei V. Tang, Wenyu Zhang, Shih Chung Chen +6 more | 2020-05-26 |
| 10608097 | Low thickness dependent work-function nMOS integration for metal gate | Paul F. Ma, Seshadri Ganguli, Shih Chung Chen, Rajesh Sathiyanarayanan, Atashi Basu +3 more | 2020-03-31 |
| 10573719 | Horizontal gate all around device isolation | Shiyu Sun, Theresa Kramer Guarini, Sung Won Jun, Benjamin Colombeau, Michael Chudzik | 2020-02-25 |
| 10553425 | Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD | Jessica S. Kachian, Mei Chang, Mary Edmonds, Andrew C. Kummel, Sang Wook Park +1 more | 2020-02-04 |