Issued Patents 2020
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10876870 | Method of determining flow rate of a gas in a substrate processing system | Risako Miyoshi, Norihiko Amikura, Kazuyuki Miura, Masaaki Nagase, Satoru Yamashita +2 more | 2020-12-29 |
| 10838435 | Pressure-type flow rate control device | Kaoru Hirata, Katsuyuki Sugita, Nobukazu Ikeda | 2020-11-17 |
| 10665430 | Gas supply system, substrate processing system and gas supply method | Atsushi Sawachi, Norihiko Amikura, Yohei Sawada, Yoshiharu Kishida | 2020-05-26 |
| 10646844 | Vaporization supply apparatus | Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Katsuyuki Sugita, Takatoshi NAKATANI +3 more | 2020-05-12 |
| 10648572 | Valve with built-in orifice, and pressure-type flow rate control device | Yohei Sawada, Kaoru Hirata, Masaaki Nagase, Nobukazu Ikeda | 2020-05-12 |
| 10641407 | Flow rate control device | Toru Hirai, Kazuyuki Morisaki, Kaoru Hirata, Nobukazu Ikeda | 2020-05-05 |
| 10604840 | Liquid level indicator and liquid raw material vaporization feeder | Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Satoru Yamashita, Keiji Hirao +1 more | 2020-03-31 |
| D879248 | Fluid control valve unit | Kohei Shigyou, Takashi Hirose, Ryousuke Dohi, Naofumi Yasumoto | 2020-03-24 |
| 10573801 | Piezoelectric linear actuator, piezoelectrically driven valve, and flow rate control device | Kohei Shigyou, Takashi Hirose, Ryousuke Dohi, Naofumi Yasumoto | 2020-02-25 |
| 10534376 | Gas divided flow supplying apparatus for semiconductor manufacturing equipment | Ryousuke Dohi, Kaoru Hirata, Katsuyuki Sugita, Nobukazu Ikeda | 2020-01-14 |