Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10464187 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Bainian Qian, Kancharla-Arun Kumar Reddy, Marty W. DeGroot | 2019-11-05 |
| 10464188 | Chemical mechanical polishing pad and polishing method | Matthew R. Gadinski, Mohammad T. Islam, Yi Guo | 2019-11-05 |
| 10391606 | Chemical mechanical polishing pads for improved removal rate and planarization | Jonathan G. Weis, Nan-Rong Chiou, Bainian Qian | 2019-08-27 |
| 10293456 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Nan-Rong Chiou, Mohammad T. Islam, Teresa Brugarolas Brufau | 2019-05-21 |
| 10259099 | Tapering method for poromeric polishing pad | Koichi Yoshida, Kazutaka Miyamoto, Katsumasa Kawabata, Henry Sanford-Crane, Hui Bin Huang +1 more | 2019-04-16 |
| 10207388 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Nan-Rong Chiou, Mohammad T. Islam | 2019-02-19 |