Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10391606 | Chemical mechanical polishing pads for improved removal rate and planarization | Nan-Rong Chiou, George C. Jacob, Bainian Qian | 2019-08-27 |
JW
Jonathan G. Weis
Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #17 of 36Top 50%
Overall (2019): #401,738 of 560,194Top 75%
1
Patents 2019