Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10391606 | Chemical mechanical polishing pads for improved removal rate and planarization | Jonathan G. Weis, George C. Jacob, Bainian Qian | 2019-08-27 |
| 10293456 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Mohammad T. Islam, George C. Jacob, Teresa Brugarolas Brufau | 2019-05-21 |
| 10207388 | Aliphatic polyurethane optical endpoint detection windows and CMP polishing pads containing them | Mohammad T. Islam, George C. Jacob | 2019-02-19 |