Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10464187 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Kancharla-Arun Kumar Reddy, George C. Jacob, Marty W. DeGroot | 2019-11-05 |
| 10391606 | Chemical mechanical polishing pads for improved removal rate and planarization | Jonathan G. Weis, Nan-Rong Chiou, George C. Jacob | 2019-08-27 |