Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10464187 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Bainian Qian, Kancharla-Arun Kumar Reddy, George C. Jacob | 2019-11-05 |