Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10464187 | High removal rate chemical mechanical polishing pads from amine initiated polyol containing curatives | Bainian Qian, George C. Jacob, Marty W. DeGroot | 2019-11-05 |
| 10316218 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Naresh Kumar Penta, Julia Kozhukh, David Mosley, Matthew Van Hanehem | 2019-06-11 |
| 10221336 | Aqueous silica slurry compositions for use in shallow trench isolation and methods of using them | Julia Kozhukh, David Mosley, Naresh Kumar Penta, Matthew Van Hanehem | 2019-03-05 |