YG

Yi Guo

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #10 of 36Top 30%
📍 Longbeilingcun, DE: #1 of 1 inventorsTop 100%
Overall (2019): #104,546 of 560,194Top 20%
2
Patents 2019

Issued Patents 2019

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10508221 Aqueous low abrasive silica slurry and amine carboxylic acid compositions for use in shallow trench isolation and methods of making and using them David Mosley, Naresh Kumar Penta 2019-12-17
10464188 Chemical mechanical polishing pad and polishing method Matthew R. Gadinski, Mohammad T. Islam, George C. Jacob 2019-11-05