MG

Matthew R. Gadinski

RH Rohm And Haas Electronic Materials Cmp Holdings: 2 patents #10 of 36Top 30%
📍 Nonatum Mills, DE: #10 of 33 inventorsTop 35%
🗺 Delaware: #88 of 593 inventorsTop 15%
Overall (2019): #144,617 of 560,194Top 30%
2
Patents 2019

Issued Patents 2019

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10464188 Chemical mechanical polishing pad and polishing method Mohammad T. Islam, Yi Guo, George C. Jacob 2019-11-05
10465097 Aliphatic UV cured polyurethane optical endpoint detection windows with high UV transparency for CMP polishing pads 2019-11-05