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Selective deposition through formation of self-assembled monolayers |
Jessica S. Kachian, Tobin Kaufman-Osborn |
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Low temperature molecular layer deposition of SiCON |
Mark Saly, Lakmal C. Kalutarage |
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Precursors for deposition of metal, metal nitride and metal oxide based films of transition metals |
Benjamin Schmiege, Jeffrey W. Anthis |
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Nitrogen-containing ligands and their use in atomic layer deposition methods |
Jeffrey W. Anthis |
2019-06-11 |
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Feng Q. Liu, Ben-Li Sheu, David Knapp |
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Selective dry etching of metal films comprising multiple metal oxides |
Jeffrey W. Anthis, Benjamin Schmiege |
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Deposition of films containing alkaline earth metals |
— |
2019-03-19 |
| 10219373 |
Selective deposition of thin film dielectrics using surface blocking chemistry |
Mark Saly, Bhaskar Jyoti Bhuyan |
2019-02-26 |
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Aluminum content control of TiAIN films |
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