Issued Patents 2019
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10510530 | Methods for forming doped silicon oxide thin films | Noboru Takamure, Hideaki Fukuda, Antti Niskanen, Suvi Haukka, Ryu Nakano +1 more | 2019-12-17 |
| 10468251 | Method for forming spacers using silicon nitride film for spacer-defined multiple patterning | Dai Ishikawa, Toshiharu Watarai | 2019-11-05 |
| 10435790 | Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gap | Masaru Zaitsu, Masaki Tokunaga, Hideaki Fukuda | 2019-10-08 |
| 10395919 | Method and apparatus for filling a gap | Zaitsu Masaru | 2019-08-27 |
| 10395917 | Si precursors for deposition of SiN at low temperatures | Antti Niskanen, Shang Chen, Viljami Pore, Hideaki Fukuda, Suvi Haukka | 2019-08-27 |
| 10262865 | Methods for manufacturing semiconductor devices | Toshihisa Nozawa | 2019-04-16 |
| 10186420 | Formation of silicon-containing thin films | — | 2019-01-22 |
| 10179947 | Method for forming conformal nitrided, oxidized, or carbonized dielectric film by atomic layer deposition | — | 2019-01-15 |