Issued Patents 2018
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10131730 | Resist composition and patterning process | Takayuki Fujiwara, Masayoshi Sagehashi, Kenichi Oikawa | 2018-11-20 |
| 10126649 | Resist composition and patterning process using the same | Jun Hatakeyama, Masayoshi Sagehashi | 2018-11-13 |
| 10125202 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Masaki Ohashi, Takayuki Nagasawa | 2018-11-13 |
| 10114287 | Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate | Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Masahiro Fukushima, Takayuki Fujiwara | 2018-10-30 |
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Teppei Adachi, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 10025180 | Sulfonium compound, resist composition, and patterning process | Ryo MITSUI, Takayuki Fujiwara, Ryosuke Taniguchi, Masaki Ohashi | 2018-07-17 |
| 10020089 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2018-07-10 |
| 10012903 | Resist composition and pattern forming process | Jun Hatakeyama | 2018-07-03 |
| 10005868 | Resist composition and patterning process using the same | Jun Hatakeyama | 2018-06-26 |
| 9991019 | Conductive polymer composite and substrate | Jun Hatakeyama, Takayuki Nagasawa | 2018-06-05 |
| 9969829 | Polymer compound, negative resist composition, laminate, patterning process, and compound | Daisuke Domon, Keiichi Masunaga, Masaaki Kotake | 2018-05-15 |
| 9904172 | Shrink material and pattern forming process | Kentaro Kumaki, Satoshi Watanabe, Daisuke Domon, Kenji Yamada | 2018-02-27 |