Issued Patents 2018
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9969829 | Polymer compound, negative resist composition, laminate, patterning process, and compound | Koji Hasegawa, Keiichi Masunaga, Masaaki Kotake | 2018-05-15 |
| 9944738 | Polymer compound, positive resist composition, laminate, and resist patterning process | Satoshi Watanabe, Keiichi Masunaga, Masaaki Kotake | 2018-04-17 |
| RE46765 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2018-03-27 |
| 9904169 | Photomask blank, resist pattern forming process, and method for making photomask | Teppei Adachi, Satoshi Watanabe, Keiichi Masunaga | 2018-02-27 |
| 9904172 | Shrink material and pattern forming process | Kentaro Kumaki, Satoshi Watanabe, Koji Hasegawa, Kenji Yamada | 2018-02-27 |
| RE46736 | Chemically amplified negative resist composition and patterning process | Keiichi Masunaga, Satoshi Watanabe | 2018-02-27 |