Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Masahiro Fukushima, Koji Hasegawa, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 10012902 | Positive resist composition and pattern forming process | Jun Hatakeyama, Masaki Ohashi | 2018-07-03 |
| 9904169 | Photomask blank, resist pattern forming process, and method for making photomask | Satoshi Watanabe, Daisuke Domon, Keiichi Masunaga | 2018-02-27 |