Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10131730 | Resist composition and patterning process | Takayuki Fujiwara, Koji Hasegawa, Kenichi Oikawa | 2018-11-20 |
| 10126649 | Resist composition and patterning process using the same | Jun Hatakeyama, Koji Hasegawa | 2018-11-13 |
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 9927708 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama | 2018-03-27 |