Issued Patents 2018
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10162262 | Resist composition and patterning process | Jun Hatakeyama | 2018-12-25 |
| 10126647 | Resist composition and patterning process | Jun Hatakeyama | 2018-11-13 |
| 10125202 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa | 2018-11-13 |
| 10120279 | Negative resist composition and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Masaaki Kotake, Kenji Yamada | 2018-11-06 |
| 10101654 | Resist composition and patterning process | Jun Hatakeyama | 2018-10-16 |
| 10101653 | Resist composition and patterning process | Jun Hatakeyama | 2018-10-16 |
| 10078264 | Resist composition, patterning process, and barium, cesium and cerium salts | Jun Hatakeyama, Takeshi Sasami | 2018-09-18 |
| 10025180 | Sulfonium compound, resist composition, and patterning process | Ryo MITSUI, Takayuki Fujiwara, Ryosuke Taniguchi, Koji Hasegawa | 2018-07-17 |
| 10012902 | Positive resist composition and pattern forming process | Jun Hatakeyama, Teppei Adachi | 2018-07-03 |
| 10007178 | Positive resist composition and patterning process | Jun Hatakeyama, Masahiro Fukushima | 2018-06-26 |
| 9989847 | Onium salt compound, resist composition, and pattern forming process | Jun Hatakeyama, Masahiro Fukushima | 2018-06-05 |
| 9958777 | Resist composition and patterning process | Jun Hatakeyama | 2018-05-01 |
| 9958776 | Resist composition and patterning process | Jun Hatakeyama | 2018-05-01 |
| 9910358 | Patterning process and chemically amplified negative resist composition | Jun Hatakeyama | 2018-03-06 |
| 9897916 | Compound, polymer compound, resist composition, and patterning process | Jun Hatakeyama, Masahiro Fukushima, Takayuki Fujiwara | 2018-02-20 |
| 9897914 | Resist composition and patterning process | Jun Hatakeyama | 2018-02-20 |