Issued Patents 2018
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10020183 | Edge roughness reduction | Yansha Jin, Zhongkui Tan, Lin Cui, Martin Shim | 2018-07-10 |
| 9997366 | Silicon oxide silicon nitride stack ion-assisted etch | Zhongkui Tan, Hua Xiang, Wenbing Hu, Qing Xu | 2018-06-12 |
| 9991128 | Atomic layer etching in continuous plasma | Zhongkui Tan, Yiting Zhang, Ying Wu, Qing Xu, Yoko Yamaguchi +1 more | 2018-06-05 |
| 9941123 | Post etch treatment to prevent pattern collapse | Mirzafer Abatchev, Yasushi Ishikawa | 2018-04-10 |
| 9859127 | Line edge roughness improvement with photon-assisted plasma process | Zhongkui Tan, Qing Xu, Sangjun Park | 2018-01-02 |