Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10020183 | Edge roughness reduction | Yansha Jin, Lin Cui, Qian Fu, Martin Shim | 2018-07-10 |
| 9997366 | Silicon oxide silicon nitride stack ion-assisted etch | Hua Xiang, Wenbing Hu, Qing Xu, Qian Fu | 2018-06-12 |
| 9991128 | Atomic layer etching in continuous plasma | Yiting Zhang, Ying Wu, Qing Xu, Qian Fu, Yoko Yamaguchi +1 more | 2018-06-05 |
| 9859127 | Line edge roughness improvement with photon-assisted plasma process | Qing Xu, Qian Fu, Sangjun Park | 2018-01-02 |