Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10096483 | Pitch reduction technology using alternating spacer depositions during the formation of a semiconductor device and systems including same | Baosuo Zhou, Ardavan Niroomand, Paul A. Morgan, Shuang Meng, Joseph Neil Greeley +1 more | 2018-10-09 |
| 9941123 | Post etch treatment to prevent pattern collapse | Qian Fu, Yasushi Ishikawa | 2018-04-10 |