| 10161035 |
Apparatus and method for purging gaseous compounds |
Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL, Jianhua Zhou, Ramprakash Sankarakrishnan |
2018-12-25 |
| 10128118 |
Bottom and side plasma tuning having closed loop control |
Juan Carlos Rocha-Alvarez, Amit Kumar BANSAL, Jianhua Zhou, Ramprakash Sankarakrishnan, Mohamad A. Ayoub +1 more |
2018-11-13 |
| 10100408 |
Edge hump reduction faceplate by plasma modulation |
Sungwon Ha, Kwangduk Douglas Lee, Juan Carlos Rocha-Alvarez, Martin Jay Seamons, Ziqing Duan +5 more |
2018-10-16 |
| 10094486 |
Method and system for supplying a cleaning gas into a process chamber |
Ramprakash Sankarakrishnan, Dale R. Du Bois, Karthik Janakiraman, Juan Carlos Rocha-Alvarez, Thomas Nowak +2 more |
2018-10-09 |
| 10060032 |
PECVD process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2018-08-28 |
| 10030306 |
PECVD apparatus and process |
Nagarajan Rajagopalan, Xinhai Han, Michael Wenyoung Tsiang, Masaki Ogata, Zhijun Jiang +17 more |
2018-07-24 |
| 9922819 |
Wafer rotation in a semiconductor chamber |
Juan Carlos Rocha-Alvarez, Ramprakash Sankarakrishnan, Robert W. Kim, Dale R. Du Bois, Kirby H. Floyd +2 more |
2018-03-20 |
