Issued Patents 2017
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9823574 | Lithography alignment marks | Ching-Huang Chen, Hung-Chang Hsieh, Kuei-Liang Lu, Spencer B. T. Lin | 2017-11-21 |
| 9805154 | Method of lithography process with inserting scattering bars | Irene Ho, Ai-Jen Hung, Hung-Chang Hsieh, Kuei-Liang Lu | 2017-10-31 |
| 9786569 | Overlay measurement and compensation in semiconductor fabrication | Wei-De Ho, Shu-Hong Lin, Chih-Jung Chiang, Chang-Yi Tsai, Tsung-Lin Yang +1 more | 2017-10-10 |
| 9766545 | Methods for small trench patterning using chemical amplified photoresist compositions | Chia-Chu Liu | 2017-09-19 |
| 9703918 | Two-dimensional process window improvement | Wei-De Ho, Chi-Yuan Sun, Hung-Chang Hsieh | 2017-07-11 |
| 9612526 | Photomask and method for fabricating integrated circuit | Chun Lin, Yi-Jie Chen, Feng-Yuan Chiu, Ying-Chou Cheng, Kuei-Liang Lu +2 more | 2017-04-04 |