Issued Patents 2017
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9823574 | Lithography alignment marks | Ching-Huang Chen, Kuei-Liang Lu, Ya Hui Chang, Spencer B. T. Lin | 2017-11-21 |
| 9805154 | Method of lithography process with inserting scattering bars | Irene Ho, Ai-Jen Hung, Kuei-Liang Lu, Ya Hui Chang | 2017-10-31 |
| 9799567 | Method of forming source/drain contact | Ming-Jhih Kuo, Yu-Hsien Lin, Jhun Hua Chen | 2017-10-24 |
| 9791775 | Lithography process on high topology features | Chun-Wei Chang, Hong-Da Lin, Chih-Chien Wang, Chun-Chang Chen, Wang-Pen Mo | 2017-10-17 |
| 9711367 | Semiconductor method with wafer edge modification | Hung-Chung Chien, Jhun Hua Chen, Shu-Fang Chen | 2017-07-18 |
| 9703918 | Two-dimensional process window improvement | Wei-De Ho, Chi-Yuan Sun, Ya Hui Chang | 2017-07-11 |
| 9651869 | Film portion at wafer edge | Chun-Wei Chang, Wang-Pen Mo | 2017-05-16 |