| 9790589 |
Gas cooled substrate support for stabilized high temperature deposition |
Brian T. West, Jeonghoon Oh |
2017-10-17 |
| 9779975 |
Electrostatic carrier for thin substrate handling |
— |
2017-10-03 |
| 9779920 |
Sputtering target with backside cooling grooves |
Brian T. West, Jeonghoon Oh |
2017-10-03 |
| 9773692 |
In-situ removable electrostatic chuck |
Lara Hawrylchak, Steven V. Sansoni |
2017-09-26 |
| 9754771 |
Encapsulated magnetron |
Brian T. West, Roger M. Johnson |
2017-09-05 |
| 9735037 |
Locally heated multi-zone substrate support |
— |
2017-08-15 |
| 9721820 |
End effector for transferring a substrate |
Michel A. Rosa |
2017-08-01 |
| 9711386 |
Electrostatic chuck for high temperature process applications |
Zheng Yuan |
2017-07-18 |
| 9649592 |
Plasma abatement of compounds containing heavy atoms |
Monique McIntosh, Colin John Dickinson, Paul Fisher, Yutaka Tanaka, Zheng Yuan |
2017-05-16 |
| 9580796 |
Deposition apparatus and methods to reduce deposition asymmetry |
Alan A. Ritchie |
2017-02-28 |
| 9552967 |
Abatement system having a plasma source |
Rongping Wang, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2017-01-24 |
| 9543124 |
Capacitively coupled plasma source for abating compounds produced in semiconductor processes |
Rongping Wang, Brian T. West, Roger M. Johnson, Colin John Dickinson |
2017-01-10 |
| 9536768 |
Electrostatic carrier for thin substrate handling |
— |
2017-01-03 |
