| 9790589 |
Gas cooled substrate support for stabilized high temperature deposition |
Michael S. Cox, Jeonghoon Oh |
2017-10-17 |
| 9779920 |
Sputtering target with backside cooling grooves |
Michael S. Cox, Jeonghoon Oh |
2017-10-03 |
| 9779917 |
Process chamber gas flow improvements |
Stanley Detmar, Ronald Vern Schauer |
2017-10-03 |
| 9767990 |
Apparatus for treating a gas in a conduit |
Jibing Zeng, Rongping Wang, Manoj A. Gajendra |
2017-09-19 |
| 9754771 |
Encapsulated magnetron |
Roger M. Johnson, Michael S. Cox |
2017-09-05 |
| 9749688 |
Systems and methods for determining multi-platform media ratings |
Lisa Heimann |
2017-08-29 |
| 9668373 |
Substrate support chuck cooling for deposition chamber |
Vijay D. Parkhe, Robert T. Hirahara, Dan DEYO |
2017-05-30 |
| 9552967 |
Abatement system having a plasma source |
Michael S. Cox, Rongping Wang, Roger M. Johnson, Colin John Dickinson |
2017-01-24 |
| 9543124 |
Capacitively coupled plasma source for abating compounds produced in semiconductor processes |
Michael S. Cox, Rongping Wang, Roger M. Johnson, Colin John Dickinson |
2017-01-10 |
