Issued Patents 2016
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9519227 | Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR) | Michael A. Carcasi, Mark H. Somervell, Joshua Hooge, Seiji Nagahara | 2016-12-13 |
| 9454081 | Line pattern collapse mitigation through gap-fill material application | Mark H. Somervell, Ian J. Brown, Steven Scheer, Joshua Hooge | 2016-09-27 |
| 9418860 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Mark H. Somervell, Makoto Muramatsu, Tadatoshi Tomita, Hisashi Genjima, Hidetami Yaegashi +1 more | 2016-08-16 |
| 9412611 | Use of grapho-epitaxial directed self-assembly to precisely cut lines | Mark H. Somervell | 2016-08-09 |
| 9349604 | Use of topography to direct assembly of block copolymers in grapho-epitaxial applications | Mark H. Somervell | 2016-05-24 |
| 9281251 | Substrate backside texturing | Carlos A. Fonseca, Anton J. deVilliers, Jeffrey Smith, Lior Huli | 2016-03-08 |