| 9466527 |
Method for creating contacts in semiconductor substrates |
— |
2016-10-11 |
| 9437447 |
Method for patterning a substrate for planarization |
— |
2016-09-06 |
| 9406526 |
Method for patterning contact openings on a substrate |
— |
2016-08-02 |
| 9396996 |
Methods of forming openings in semiconductor structures |
Adam L. Olson, Kaveri Jain, Lijing Gou, William R. Brown, Ho Seop Eom +1 more |
2016-07-19 |
| 9396958 |
Self-aligned patterning using directed self-assembly of block copolymers |
Andrew Metz |
2016-07-19 |
| 9385276 |
Epitaxial devices |
Erik Byers, Scott E. Sills |
2016-07-05 |
| 9378974 |
Method for chemical polishing and planarization |
— |
2016-06-28 |
| 9340411 |
Defect-less directed self-assembly |
— |
2016-05-17 |
| 9291907 |
Methods for forming resist features and arrays of aligned, elongate resist features |
Kaveri Jain, Adam L. Olson, William R. Brown, Lijing Gou, Ho Seop Eom |
2016-03-22 |
| 9281251 |
Substrate backside texturing |
Carlos A. Fonseca, Benjamen M. Rathsack, Jeffrey Smith, Lior Huli |
2016-03-08 |
| 9263297 |
Method for self-aligned double patterning without atomic layer deposition |
— |
2016-02-16 |
| 9240329 |
Method for multiplying pattern density by crossing multiple patterned layers |
— |
2016-01-19 |
| 9235134 |
Lens heating compensation in photolithography |
Yuan He, Kaveri Jain, Lijing Gou, Zishu Zhang, Michael Hyatt +3 more |
2016-01-12 |
