Issued Patents 2016
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9530637 | Fin structure formation by selective etching | Hua Chung | 2016-12-27 |
| 9508831 | Method for fabricating vertically stacked nanowires for semiconductor applications | Hua Chung | 2016-11-29 |
| 9478433 | Cyclic spacer etching process with improved profile control | Qingjun Zhou, Jungmin Ko, Tom Choi, Sean S. Kang, Jeremiah T. Pender +1 more | 2016-10-25 |
| 9431266 | Double patterning method | Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz | 2016-08-30 |
| 9431252 | Tunneling field effect transistor (TFET) formed by asymmetric ion implantation and method of making same | — | 2016-08-30 |
| 9419107 | Method for fabricating vertically stacked nanowires for semiconductor applications | Hua Chung | 2016-08-16 |
| 9412603 | Trimming silicon fin width through oxidation and etch | Hua Chung | 2016-08-09 |
| 9401310 | Method to form trench structure for replacement channel growth | Hua Chung | 2016-07-26 |
| 9373546 | Self aligned replacement Fin formation | Hua Chung | 2016-06-21 |
| 9343354 | Middle of line structures and methods for fabrication | Qinghuang Lin | 2016-05-17 |
| 9287386 | Method for fabricating vertically stacked nanowires for semiconductor applications | Hua Chung | 2016-03-15 |
| 9269634 | Self-aligned metal gate CMOS with metal base layer and dummy gate structure | Kangguo Cheng, Bruce B. Doris | 2016-02-23 |
| 9252250 | Tunneling field effect transistor (TFET) with ultra shallow pockets formed by asymmetric ion implantation and method of making same | — | 2016-02-02 |
| 9252023 | Etching method and apparatus | Shih-Hung Chen, Chien-An Chen, Ying Xiao | 2016-02-02 |
| 9245791 | Method for fabricating a contact | Qinghuang Lin | 2016-01-26 |